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    Optimal technological modes of ion implantation and following annealing for forming thin nanosized films of silicides

    Optimal technological modes of ion implantation and following annealing for forming thin nanosized films of silicides by Rysbaev, A.S., Irgashev, S.U., Kasimov, A.S., Juraeva, D.Sh, Khujaniyazov, J.B., Khudoyberdieva, M.I.

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