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Surface recombination probabilities of H on stainless steel, a-Si:H and oxidized silicon determined by threshold ionization mass spectrometry in H2 RF discharges
by
KAE-NUNE, P
,
PERRIN, J
,
JOLLY, J
,
GUILLON, J
Published in
Surface science
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Surface recombination probabilities of H on stainless steel, a-Si:H and oxidized silicon determined by threshold ionization mass spectrometry in H 2 RF discharges
by
Kae-Nune, Patrick
,
Perrin, Jérôme
,
Jolly, Jacques
,
Guillon, Jean
Published in
Surface science
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Mass Spectrometry Detection of SiH m and CH m Radicals from SiH 4 –CH 4 –H 2 RF Discharges under High Temperature Deposition Conditions of Silicon Carbide
by
Kae-Nune, Patrick
,
Perrin, Jérôme
,
Jean Guillon, Jean Guillon
,
Jacques Jolly, Jacques Jolly
Published in
Japanese Journal of Applied Physics
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Surface Science
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Japanese Journal Of Applied Physics
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Appearance Potential Spectroscopy
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Atom-Solid Interactions
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Etching
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Hydrogen
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Physics
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Surface Chemical Reaction
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Chemistry
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Chemistry, Physical
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Cross-Disciplinary Physics: Materials Science; Rheology
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Exact Sciences And Technology
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Materials Science
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Physical Sciences
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Physics, Condensed Matter
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Science & Technology
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Surface Cleaning, Etching, Patterning
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Surface Treatments
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Sciencedirect Journals
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Sciencedirect Freedom Collection 2022-2024
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Backfile Package - Physics General (Legacy) [Ypa]
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Institute Of Physics Iopscience Extra
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