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Precise measurement of the temperature of a silicon wafer by an optical-interference contactless thermometer during rapid plasma processing
by
Kameda, Asaki
,
Mizukawa, Yuri
,
Hanafusa, Hiroaki
,
Higashi, Seiichiro
Published in
Journal of applied physics
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In situ monitoring to visualize temperature distribution in molten silicon region formed under atmospheric pressure thermal plasma jet irradiation
by
Mizukawa, Yuri
,
Kameda, Asaki
,
Hanafusa, Hiroaki
,
Higashi, Seiichiro
Published in
Applied physics express
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Applied Physics Express
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Journal Of Applied Physics
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Physical Sciences
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Physics
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Physics, Applied
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Science & Technology
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Annealing
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Applied Physics
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Atmospheric Pressure Thermal Plasma Jet
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Crystallization
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Interference
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Non-Contact Temperature Measurement
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Plasma Jets
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Plasma Processing
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Room Temperature
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Silicon Substrates
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Silicon Wafers
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Temperature
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Temporal Resolution
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Thermal Plasmas
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Thermocouples
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American Institute Of Physics:jisc Collections:transitional Journals Agreement 2021-23 (Reading List)
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Institute Of Physics:jisc Collections:iop Publishing Read And Publish 2024-2025 (Reading List)
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Aip Digital Archive
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Institute Of Physics Iopscience Extra
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American Institute Of Physics
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