Search Results - Kaminatsui, Takeshi

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  1. 1
    H2/N2 plasma damage on porous dielectric SiOCH film evaluated by in situ film characterization and plasma diagnostics

    H2/N2 plasma damage on porous dielectric SiOCH film evaluated by in situ film characterization and plasma diagnostics by Yamamoto, Hiroshi, Takeda, Keigo, Ishikawa, Kenji, Ito, Masafumi, Sekine, Makoto, Hori, Masaru, Kaminatsui, Takeshi, Hayashi, Hisataka, Sakai, Itsuko, Ohiwa, Tokuhisa

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  2. 2
    Ion energy control in reactive ion etching using 1-MHz pulsed-DC square-wave-superimposed 100-MHz RF capacitively coupled plasma

    Ion energy control in reactive ion etching using 1-MHz pulsed-DC square-wave-superimposed 100-MHz RF capacitively coupled plasma by Ui, Akio, Hayashi, Hisataka, Sakai, Itsuko, Kaminatsui, Takeshi, Ohiwa, Tokuhisa, Yamamoto, Katsumi, Kikutani, Keisuke

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    H 2 /N 2 plasma damage on porous dielectric SiOCH film evaluated by in situ film characterization and plasma diagnostics

    H 2 /N 2 plasma damage on porous dielectric SiOCH film evaluated by in situ film characterization and plasma diagnostics by Yamamoto, Hiroshi, Takeda, Keigo, Ishikawa, Kenji, Ito, Masafumi, Sekine, Makoto, Hori, Masaru, Kaminatsui, Takeshi, Hayashi, Hisataka, Sakai, Itsuko, Ohiwa, Tokuhisa

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  4. 4
    H{sub 2}/N{sub 2} plasma damage on porous dielectric SiOCH film evaluated by in situ film characterization and plasma diagnostics

    H{sub 2}/N{sub 2} plasma damage on porous dielectric SiOCH film evaluated by in situ film characterization and plasma diagnostics by Yamamoto, Hiroshi, Takeda, Keigo, Ishikawa, Kenji, Hori, Masaru, Plasma Nanotechnology Research Center, Nagoya University, Nagoya 464-8603, Ito, Masafumi, Sekine, Makoto, Kaminatsui, Takeshi, Hayashi, Hisataka, Sakai, Itsuko, Ohiwa, Tokuhisa

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