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Analysis of ferroelectric properties of ALD-Hf0.5Zr0.5O2 thin films according to oxygen sources
by
Lee, Seungbin
,
Jung, Yong Chan
,
Park, Hye Ryeon
,
Park, Seongbin
,
Kang, Jongmug
,
Jeong, Juntak
,
Choi, Yeseo
,
Kim, Jin-Hyun
,
Mohan, Jaidah
,
Kim, Harrison Sejoon
,
Kim, Jiyoung
,
Kim, Si Joon
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Solid-state electronics
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BEOL Compatible Ultra-Low Operating Voltage (0.5 V) and Preconfigured Switching Polarization States in Effective 3 nm Ferroelectric HZO Capacitors
by
Lee, Minjong
,
Kim, Jin-Hyun
,
Le, Dan N.
,
Lee, Seojun
,
Song, Si-Un
,
Choi, Rino
,
Ahn, Youngbae
,
Ryu, Seung Wook
,
Cha, Pil-Ryung
,
Nam, Chang-Yong
,
Park, Seongbin
,
Kang, Jongmug
,
Kim, Si Joon
,
Kim, Jiyoung
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Solid-State Electronics
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Annealing
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Atomic Layer Deposition
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Beol Compatibility
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Capacitors
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Deuterium
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Effective 3 Nm Hzo
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Ferroelectric Devices
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Ferroelectricity
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Hf0.5Zr0.5O2
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Hydrogen
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Oxygen Source
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