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Blockcopolymer Self-Assembly Directed by Photochemically Attached Polymer Surface Layer
by
Hattori, Shigeki
,
Asakawa, Koji
,
Mikoshiba, Satoshi
,
Nakamura, Hiroko
,
Hieno, Atsushi
,
Seino, Yuriko
,
Kanno, Mashiro
,
Azuma, Tsukasa
Published in
Journal of Photopolymer Science and Technology
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Journal Of Photopolymer Science And Technology
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Block Copolymer
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Block Copolymers
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Blockcopolymer
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Blocking
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Directed Self-Assembly
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Orientation
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Photochemical
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Physical Sciences
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Polyhedral Oligomeric Silsesquioxane
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Polymer Science
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Ps-B-Pmma
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Science & Technology
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Self Assembly
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Silicon
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Solvent Annealing
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Surface Layer
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