Search Results - Kasica, R.J.

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  1. 1
    Monte Carlo study of high performance resists for SCALPEL nanolithography

    Monte Carlo study of high performance resists for SCALPEL nanolithography by Ocola, L.E., Li, W-Y., Kasica, R.J., Blakey, M.I., Orphanos, P.A., Waskiewicz, W.K., Novembre, A.E., Sato, M.

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  2. 2
    Pattern processing results and characteristics for SCALPEL masks

    Pattern processing results and characteristics for SCALPEL masks by Novembre, A.E., Blakey, M.I., Farrow, R.C., Kasica, R.J., Knurek, C.S., Liddle, J.A., Peabody, M.L.

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    New Strategies for Improvement and Implementation of the Digital Electrostatic e-beam Array Lithography (DEAL) Concept

    New Strategies for Improvement and Implementation of the Digital Electrostatic e-beam Array Lithography (DEAL) Concept by Randolph, S.J., Baylor, L.R., Klein, K.L., Gardner, W.L., Kasica, R.J., Guillorn, M.A., Hensley, D.K., Meyer, H.M., Islam, S., Rack, P.D., Rucker, R., Rahman, T., Grundman, T., Bigelow, T., Eliza, S.A., Vijayar, R., Moore, J.A., Simpson, M.L., Ericson, M.N.

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