Search Results - Keo Myoung Shin

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    Titanium Silicide on Si:P With Precontact Amorphization Implantation Treatment: Contact Resistivity Approaching 1 \times 10^ Ohm-cm2

    Titanium Silicide on Si:P With Precontact Amorphization Implantation Treatment: Contact Resistivity Approaching 1 \times 10^ Ohm-cm2 by Hao Yu, Schaekers, Marc, Peter, Anthony, Pourtois, Geoffrey, Rosseel, Erik, Joon-Gon Lee, Woo-Bin Song, Keo Myoung Shin, Everaert, Jean-Luc, Soon Aik Chew, Demuynck, Steven, Daeyong Kim, Barla, Kathy, Mocuta, Anda, Horiguchi, Naoto, Thean, Aaron Voon-Yew, Collaert, Nadine, De Meyer, Kristin

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