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Computational fluid dynamics modeling of a wafer etch temperature control system
by
Oyama, Henrique
,
Nieman, Kip
,
Tran, Anh
,
Keville, Bernard
,
Wu, Yewei
,
Durand, Helen
Published in
Digital Chemical Engineering
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Attenuation of wall disturbances in an electron cyclotron resonance oxygen–argon plasma using real time control
by
Keville, Bernard
,
Gaman, Cezar
,
Zhang, Yang
,
Holohan, Anthony M.
,
Turner, Miles M.
,
Daniels, Stephen
Published in
Journal of vacuum science & technology. A, Vacuum, surfaces, and films
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Real-time control of electron density in a capacitively coupled plasma
by
Keville, Bernard
,
Zhang, Yang
,
Gaman, Cezar
,
Holohan, Anthony M.
,
Daniels, Stephen
,
Turner, Miles M.
Published in
Journal of vacuum science & technology. A, Vacuum, surfaces, and films
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Journal Title
Journal Of Vacuum Science & Technology. A, Vacuum, Surfaces, And Films
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Digital Chemical Engineering
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Journal Of Vacuum Science & Technology A: Vacuum, Surfaces, And Films
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Subjects
Science & Technology
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Technology
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Argon
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Closed-Loop Control
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Engineering
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Materials Science
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Materials Science, Coatings & Films
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Physical Sciences
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Physics
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Physics, Applied
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70 Plasma Physics And Fusion Technology
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Algorithms
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Classical And Quantum Mechanics, General Physics
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Computational Fluid Dynamics
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Condensed Matter Physics
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Disturbances
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Electron Cyclotron-Resonance
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Electron Density
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Emission Spectroscopy
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Engineering, Chemical
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American Institute Of Physics:jisc Collections:transitional Journals Agreement 2021-23 (Reading List)
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Aip Digital Archive
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Elsevier Sciencedirect Journals
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Doaj Directory Of Open Access Journals
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Road: Directory Of Open Access Scholarly Resources
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Ezb-Free-00999 Freely Available Ezb Journals
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