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Search Results - Khaderbad, M.A.
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Metallated Porphyrin Self Assembled Monolayers as Cu Diffusion Barriers for the Nano-Scale CMOS Technologies
by
Khaderbad, M.A.
,
Nayak, K.
,
Yedukondalu, M.
,
Ravikanth, M.
,
Mukherji, S.
,
Rao, V.R.
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Hydroxy-phenyl Zn(II) porphyrin self-assembled monolayer as a diffusion barrier for copper-low k interconnect technology
by
Roy, U.
,
Khaderbad, M.A.
,
Yedukondalu, M.
,
Walawalkar, M.G.
,
Ravikanth, M.
,
Mukherji, S.
,
Rao, V.R.
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Conference Proceedings
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Copper
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Bias-Temperature Stress
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1
Cmos Technology
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1
Dielectrics
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Diffusion Barrier
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Fourier Transforms
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Gold
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Hydrogen
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Infrared Spectra
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Interconnect
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Low-K Dielectric
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Metal-Insulator Structures
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Metallization
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Self-Assembled Monolayer
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Silicon
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Spectroscopy
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Stress
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Substrates
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Surface Morphology
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Testing
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Ieee Electronic Library (Iel) Conference Proceedings
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Ieee Xplore All Conference Series
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