Boosting Ge-Epi P-Well Mobility & Crystal Quality with Si or Sn Implantation and Melt Annealing by Borland, John O, Chaung, Shang-Shuin, Tseng, Tseung-Yuen, Joshi, Abhijeet, Basol, Bulent, Lee, Yao Jen, Kuroi, Takashi, Tabata, Toshiyuki, Huet, Karim, Goodman, Gary, Khapochkina, Nadya, Buyuklimanli, Temel

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