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Search Results - Kheng-Chok Tee
Search Results - Kheng-Chok Tee
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Robust Electromigration reliability through engineering optimization
by
Ng, Wee Loon
,
Tee, Kheng Chok
,
Liu, Junfeng
,
Ee, Yong Chiang
,
Aubel, Oliver
,
Tan, Chuan Seng
,
Pey, Kin Leong
Published in
Microelectronics and reliability
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SDODEL MOSFET for performance enhancement
by
King Jien Chui
,
Samudra, G.S.
,
Yee-Chia Yeo
,
Kheng-Chok Tee
,
Leong, K.-W.
,
Kian Meng Tee
,
Benistant, F.
,
Lap Chan
Published in
IEEE electron device letters
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Effective Channel Length Shortening and Mobility Increase of p-Channel Metal Oxide Semiconductor Transistors Resulting in Higher Drive Current Using Short Source–Drain Diffusion Le...
by
See, Kwang-Seng
,
Lau, Wai-Shing
,
Liao, Hong
,
Eng, Chee-Wee
,
Tee, Kian-Meng
,
Quek, Elgin Kiok-Boone
,
Tee, Kheng-Chok
,
Chan, Lap-Hung
Published in
Japanese Journal of Applied Physics
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Improving the Accuracy of Modified Shift-and-Ratio Channel Length Extraction Method Using Scanning Capacitance Microscopy
by
Eng, Chee-Wee
,
Lau, Wai-Shing
,
Jiang, Yao-Yao
,
Vigar, David
,
Tee, Kheng-Chok
,
Chan, Lap
,
Lim, Vanissa Sei-Wei
,
Trigg, Alastair
Published in
Japanese Journal of Applied Physics
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Selective Filling and Sintering of Copper Nanoclusters for Interconnect
by
Kheng Chok Tee
,
Lassesson, A.
,
van Lith, J.
,
Brown, S.A.
,
Partridge, J.G.
,
Schulze, M.
,
Blaikie, R.J.
Published in
IEEE transactions on nanotechnology
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Reduced Hot-Carrier Induced Degradation of NMOS I/O Transistors with Sub-micron Source-Drain Diffusion Length for 0.11 µm Dual Gate Oxide CMOS Technology
by
See, Kwang-Seng
,
Lau, Wai-Shing
,
Toh, Suey-Li
,
Liao, Hong
,
Lee, Jae Gon
,
Li, Kun
,
Quek, Elgin Kiok-Boone
,
Tee, Kheng-Chok
,
Chan, Lap-Hung
Published in
Japanese Journal of Applied Physics
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Enhancement of hot-carrier injection resistance for deep submicron transistor gate dielectric with a powered solenoid
by
Cha, Cher-Liang
,
Tee, Kheng-Chok
,
Chor, Eng-Fong
,
Gong, Hao
,
Prasad, Krishnamachar
,
Bourdillon, Anthony J.
,
See, Alex
,
Chan, Lap
,
Lee, Mike Myung-Ok
Published in
Applied physics letters
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Journal Title
Japanese Journal Of Applied Physics
3 results
3
Japanese Journal Of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers
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2
Japanese Journal Of Applied Physics, Part 1: Regular Papers And Short Notes And Review Papers
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2
Japanese Journal Of Applied Physics. Part. 1, Regular Papers, Brief Communications & Review Papers
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2
Applied Physics Letters
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1
Ieee Electron Device Letters
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Ieee Transactions On Nanotechnology
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Jpn.j.appl.phys ,Part 1. Vol. 43, No. 3, Pp. 925-930. 2004
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Microelectronics And Reliability
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Microelectronics Reliability/Microelectronics And Reliability
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Science & Technology
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Engineering, Electrical & Electronic
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Semiconductor Electronics. Microelectronics. Optoelectronics. Solid State Devices
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Technology
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Design. Technologies. Operation Analysis. Testing
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Effective Channel Length
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Nanoscience & Nanotechnology
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Science & Technology - Other Topics
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Source-Drain Diffusion Length
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Annealing
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Annealing Processes
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Capacitance
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Institute Of Physics Iopscience Extra
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Ieee Electronic Library (Iel) Journals
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Ieee Xplore All Journals
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American Institute Of Physics:jisc Collections:transitional Journals Agreement 2021-23 (Reading List)
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Sciencedirect (Online Service)
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Sciencedirect Freedom Collection
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Aip Digital Archive
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Aip 美国物理联合会现刊(与Nstl共建)
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Backfile Package - Engineering And Technology [Yen]
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