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Optimal technological modes of ion implantation and following annealing for forming thin nanosized films of silicides
by
Rysbaev, A.S.
,
Irgashev, S.U.
,
Kasimov, A.S.
,
Juraeva, D.Sh
,
Khujaniyazov, J.B.
,
Khudoyberdieva, M.I.
Published in
Eurasian journal of physics and functional materials
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Eurasian Journal Of Physics And Functional Materials
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Implantation
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Ion
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Nanoscale Films
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Optimal Structure
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Silicide
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Silicon
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Single Crystal
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Spectrum Of Photoelectrons
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Surface
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Surface Structure
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Zone Energy Diagram
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