Search Results - Kim, Dong-sauk

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    Study on self-aligned contact oxide etching using C5F8∕O2∕Ar and C5F8∕O2∕Ar∕CH2F2 plasma

    Study on self-aligned contact oxide etching using C5F8∕O2∕Ar and C5F8∕O2∕Ar∕CH2F2 plasma by Kim, Seung-bum, Choi, Dong-goo, Hong, Tea-eun, Park, Tae-su, Kim, Dong-sauk, Song, Yong-wook, Kim, Chang-il

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    Study on self-aligned contact oxide etching using C 5 F 8 ∕ O 2 ∕ Ar and C 5 F 8 ∕ O 2 ∕ Ar ∕ C H 2 F 2 plasma

    Study on self-aligned contact oxide etching using C 5 F 8 ∕ O 2 ∕ Ar and C 5 F 8 ∕ O 2 ∕ Ar ∕ C H 2 F 2 plasma by Kim, Seung-bum, Choi, Dong-goo, Hong, Tea-eun, Park, Tae-su, Kim, Dong-sauk, Song, Yong-wook, Kim, Chang-il

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