Search Results - Kim, Gee-Man

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  1. 1
    Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films

    Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films by Park, Tae Joo, Kim, Jeong Hwan, Jang, Jae Hyuck, Hwang, Cheol Seong, Kim, Gee-Man, Choi, Kang Jun, Jeong, Jae Hak

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  2. 2
    Effective work function tunability and interfacial reactions with underlying Hf O 2 layer of plasma-enhanced atomic layer deposited Ta C x N y films

    Effective work function tunability and interfacial reactions with underlying Hf O 2 layer of plasma-enhanced atomic layer deposited Ta C x N y films by Park, Tae Joo, Kim, Jeong Hwan, Jang, Jae Hyuck, Na, Kwang Duk, Hwang, Cheol Seong, Kim, Gee-Man, Choi, Kang Jun, Jeong, Jae Hak

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  3. 3
    Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar∕H2 plasma

    Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar∕H2 plasma by Park, Tae Joo, Kim, Jeong Hwan, Jang, Jae Hyuck, Hwang, Cheol Seong, Kim, Jong Hoon, Kim, Gee-Man, Choi, Jae Ho, Choi, Kang Joon, Jeong, Jae Hak

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  4. 4
    Improved electrical performances of plasma-enhanced atomic layer deposited TaC x N y films by adopting Ar ∕ H 2 plasma

    Improved electrical performances of plasma-enhanced atomic layer deposited TaC x N y films by adopting Ar ∕ H 2 plasma by Park, Tae Joo, Kim, Jeong Hwan, Jang, Jae Hyuck, Na, Kwang Duk, Hwang, Cheol Seong, Kim, Jong Hoon, Kim, Gee-Man, Choi, Jae Ho, Choi, Kang Joon, Jeong, Jae Hak

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  5. 5
    Improved electrical performances of plasma-enhanced atomic layer deposited TaC{sub x}N{sub y} films by adopting Ar/H{sub 2} plasma

    Improved electrical performances of plasma-enhanced atomic layer deposited TaC{sub x}N{sub y} films by adopting Ar/H{sub 2} plasma by Park, Tae Joo, Kim, Jeong Hwan, Jang, Jae Hyuck, Na, Kwang Duk, Hwang, Cheol Seong, Kim, Jong Hoon, Kim, Gee-Man, Choi, Jae Ho, Choi, Kang Joon, Jeong, Jae Hak, Process Development Division, Quros. Co., Ltd., San 14-1, Chunghak-dong, Osan-si, Gyunggi-do 446-712

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  6. 6
    Development of MURCC code for the efficient multi-unit level 3 probabilistic safety assessment

    Development of MURCC code for the efficient multi-unit level 3 probabilistic safety assessment by Jung, Woo Sik, Lee, Hye Rin, Kim, Jae-Ryang, Lee, Gee Man

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  7. 7
    Development of MURCC code for the efficient multi-unit level 3 probabilistic safety assessment

    Development of MURCC code for the efficient multi-unit level 3 probabilistic safety assessment by Jung, Woo Sik, Lee, Hye Rin, Kim, Jae-Ryang, Lee, Gee Man

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