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Analysis of electron thermal properties in Ar/O2 inductively coupled plasmas: A global model simulation using Langmuir probe data
by
Seo, Hwiwon
,
Lee, Haneul
,
Kwon, Ji-Won
,
Kim, Gwanjoong
,
Lee, Ingyu
,
Kim, Gon-Ho
Published in
Current applied physics
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Application of Plasma Information-Based Virtual Metrology (PI-VM) for Etching in C₄F₈/Ar/O₂ Plasma
by
Kim, Gwanjoong
,
Kwon, Ji-Won
,
Lee, Ingyu
,
Seo, Hwiwon
,
Park, Jong-Bae
,
Shin, Jong-Hyeon
,
Kim, Gon-Ho
Published in
IEEE transactions on semiconductor manufacturing
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Current Applied Physics
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Ieee Transactions On Semiconductor Manufacturing
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Subjects
Electron Energy Distribution Function
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Electronegative Plasma
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Etching
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Global Model
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Inductively Coupled Plasma
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Materials Science
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Materials Science, Multidisciplinary
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Metrology
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Optical Emission Spectroscopy
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Physical Sciences
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Physics
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Physics, Applied
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Plasma Applications
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Plasma Measurements
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Polymers
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Process Control
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Science & Technology
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Semiconductor Device Manufacture
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Semiconductor Plasmas
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Sensor Data-Driven Model
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Sciencedirect®
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Elsevier
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Ieee Electronic Library (Iel) Journals
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Ieee Xplore All Journals
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