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Search Results - Klimecky, Pete
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Compensation for transient chamber wall condition using real-time plasma density feedback control in an inductively coupled plasma etcher
by
Klimecky, Pete I.
,
Grizzle, J. W.
,
Terry, Fred L.
Published in
Journal of vacuum science & technology. A, Vacuum, surfaces, and films
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In situ measurements of HCl during plasma etching of poly-silicon using a diode laser absorption sensor
by
Kim, Suhong
,
Klimecky, Pete
,
Jeffries, Jay B
,
Jr, Fred L Terry
,
Hanson, Ronald K
Published in
Measurement science & technology
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Real-time reactive ion etch metrology techniques to enable in situ response surface process characterization
by
KLIMECKY, Pete
,
GARVIN, Craig
,
GALARZA, Cecilia G
,
STUTZMAN, Brooke S
,
KHARGONEKAR, Pramod P
,
TERRY, Fred L
Published in
Journal of the Electrochemical Society
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In-situ spectroscopic reflectometry for polycrystalline silicon thin film etch rate determination during reactive ion etching
by
BENSON, T. E
,
KAMLET, L. I
,
KLIMECKY, P
,
TERRY, F. L
Published in
Journal of electronic materials
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In-situ spectroscopic reflectometry for polycrystalline silicon thin film etch rate determination during reactive ion etchinc
by
Benson, Tyrone E.
,
Kamlet, Leonard I.
,
Klimecky, Pete
,
Terry, Fred L.
Published in
Journal of electronic materials
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