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    Modeling of the long-range interstitial migration of ion implanted boron

    Modeling of the long-range interstitial migration of ion implanted boron by Velichko, O.I., Kniazhava, N.V.

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    Simulation of boron diffusion during low-temperature annealing of implanted silicon

    Simulation of boron diffusion during low-temperature annealing of implanted silicon by Velichko, O. I., Kavaliova, A. P.

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