A synchrotron beamline for extreme-ultraviolet photoresist testing by Tarrio, C., Grantham, S., Hill, S. B., Faradzhev, N. S., Richter, L. J., Knurek, C. S., Lucatorto, T. B.

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Pattern processing results and characteristics for SCALPEL masks by Novembre, A.E., Blakey, M.I., Farrow, R.C., Kasica, R.J., Knurek, C.S., Liddle, J.A., Peabody, M.L.

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Space-charge limitations to throughput in projection electron-beam lithography (SCALPEL) by Liddle, J.A., Blakey, M.I., Knurek, C.S., Mkrtchyan, M.M., Novembre, A.E., Ocola, L., Saunders, T., Waskiewicz, W.K.

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Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system by Liddle, J. A., Blakey, M. I., Bolan, K., Farrow, R. C., Gallatin, G. M., Kasica, R., Katsap, V., Knurek, C. S., Li, J., Mkrtchyan, M., Novembre, A. E., Ocola, L., Orphanos, P. A., Peabody, M. L., Stanton, S. T., Teffeau, K., Waskiewicz, W. K., Munro, E.

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The SCALPEL proof of concept system by Harriott, L.R., Berger, S.D., Biddick, C., Blakey, M.I., Bowler, S.W., Brady, K., Camarda, R.M., Connelly, W.F., Crorken, A., Custy, J., DeMarco, R., Farrow, R.C., Felker, J.A., Fetter, L., Freeman, R., Hopkins, L., Huggins, H.A., Knurek, C.S., Kraus, J.S., Liddle, J.A., Mkrtychan, M., Novembre, A.E., Peabody, M.L., Tarascon, R.G., Wade, H.H., Waskiewicz, W.K., Watson, G.P., Werder, K.S., Windt, D.

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Pattern placement correction methodology for 200 mm SCALPEL masks by Ocola, L. E., Farrow, R. C., Kasica, R. J., Caminos, C. G., Rutberg, L., Fullowan, R. F., Teffeau, K., Blakey, M. I., Peabody, M. L., Knurek, C. S., Bogart, G. R., Novembre, A. E., Liddle, J. A., Lercel, M., Magg, C., Collins, K., Trybendis, M., Cadwell, N., Jeffer, R., Dauksher, W. J., Resnick, D. J., Mancini, D., Han, S. I., Masnyj, Z., Smith, K., Mangat, P. J. S.

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The SCattering with Angular Limitation in Projection Electron-beam Lithography (SCALPEL) system by LIDDLE, J. A, BERGER, S. D, CUSTY, J, FARROW, R. C, FELKER, J. A, FETTER, L. A, FREEMAN, B, HARRIOTT, L. R, HOPKINS, L.L, HUGGINS, H. A, KNUREK, C. S, KRAUS, J. S, BIDDICK, C. J, MIXON, D. A, MKRTCHYAN, M. M, NOVEMBRE, A. E, PEABODY, M. L, SIMPSON, W. M, TARASCON, R. G, WADE, H. H, WASKIEWICZ, W. K, WATSON, G. P, WILLIAMS, J. K, BLAKEY, M. I, WINDT, D. L, BOLAN, BOWLER, S. W, BRADY, K, CAMARDA, R. M, CONNELLY, W. F, CHORKEN, A

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“It Takes Some Empathy, Sympathy, and Listening”: Telephone Outreach to Older Detroiters in a Pandemic as a Modality to Gain an Understanding of Challenges and Resiliency by Rorai, Vanessa O., Perry, Tam E., Whitney, Sarah E., Gianfermi, Hannah C., Mitchell, Jamie A., Key, Kent D., Lichtenberg, Peter A., Taylor, Robert Joseph, Ilardo, Joan L., Knurek, Sean M., Conyers, Christian S.

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Lithographic results of electron beam photoresists prepared by living free radical polymerization by BIGNOZZI, M. C, OBER, C. K, NOVEMBRE, A. J, KNUREK, C

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Variables Affecting Reactions to Social Acceptance and Rejection by Jones, Stephen C., Knurek, Dennis A., Regan, Dennis T.

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