Effect of deposition parameters on the superhardness and stoichiometry of nanostructured Ti–Hf–Si–N films by Pogrebnyak, A. D., Beresnev, V. M., Shpak, A. P., Konarskii, P., Komarov, F. F., Kirik, G. V., Makhmudov, N. A., Kolesnikov, D. A., Uglov, V. V., Sobol, O. V., Kaverin, M. V., Grudnitskii, V. V.

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