Optimisation criteria for the process electron beam lithography of negative AR-N7520 resists by Koleva, E, Kostic, I, Andok, R, Vutova, K, Bencurova, A, Konecnikova, A

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Comparative study of the sidewall shape and proximity effect of the AR-N 7520 negative electron beam resist by Kostic, I, Vutova, K, Koleva, E, Bencurova, A, Konecnikova, A, Andok, R

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Patterning of structures by e-beam lithography and ion etching for gas sensor applications by Durina, P, Bencurova, A, Konecnikova, A, Kostic, I, Vutova, K, Koleva, E, Mladenov, G, Kus, P, Plecenik, A

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Advanced patterning techniques for nanodevice fabrication by KOSTIC, I, ANDOK, R, BARAK, V, CAPLOVIC, I, KONECNIKOVA, A, MATAY, L, HRKUT, P, RITOMSKY, A

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Properties of nano-scaled disperse media investigated by refractometric measurements by Sarov, Y., Capek, I., Janíc˘ková, S., Kostic˘, I., Konec˘níková, A., Matay, L., Sarova, V.

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Structural characterization of a lamellar W/Si multilayer grating by Jergel, M., Mikulı́k, P., Majková, E., Luby, Š., Senderák, R., Pinčı́k, E., Brunel, M., Hudek, P., Kostič, I., Konečnı́ková, A.

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Structural characterization of lamellar multilayer gratings by x-ray reflectivity and scanning electron microscopy by Jergel, M, Mikulík, P, Majková, E, Luby, S, Senderák, R, Pincík, E, Brunel, M, Hudek, P, Kostic, I, Konecníková, A

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Dry etching of carbon layers in various etch gases by Haščı́k, Š, Hrkút, P, Kostič, I, Konečnı́ková, A

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Structural characterization of lamellar multilayer gratings by x-ray reflectivity and scanning electron microscopy: Special issue on high resolution x-ray diffraction and topograph... by JERGEL, M, MIKULIK, P, MAJKOVA, E, LUBY, S, SENDERAK, R, PINCIK, E, BRUNEL, M, HUDEK, P, KOSTIC, I, KONECNIKOVA, A

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Estimation of exposure parameters of chosen e-beam resists using variable shaped e-beam pattern generator by Andok, R., Matay, L., Kostic, I., Bencurova, A., Nemec, P., Konecnikova, A., Ritomsky, A.

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Characterization of laterally nanopatterned W/Si multilayers by Hudek, P., Kostic, I., Konecnikova, A., Mikulik, P., Jergel, M., Majkova, E., Luby, S., Senderak, R., Pincik, E., Brunel, M.

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Material optimization of the alignment marks for the EBDW lithography by Matay, L, Andok, R, Barák, V, Ritomský, A, Konečniková, A, Kostič, I, Partel, S, Hudek, P

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Patterning of nanometer structures by using direct-write e-beam lithography for the sensor development by Ďurina, P, Štefečka, M, Roch, T, Noskovič, J, Trgala, M, Pidík, A, Kostič, I, Konečniková, A, Matay, L, Kúš, P, Plecenik, P

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New progressive method suitable for the exposure optimization of large and complex defect-free chips direct written by ZBA 21 e-beam tool by Matay, L., Andok, R., Barak, V., Konecnikova, A., Kostic, I., Partel, S., Hudek, P.

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Study of lithographic parameters for the trilayer resist systems in electron beam lithography by Andok, Robert, Vutova, Katia, Konecnikova, Anna, Ritomsky, Mario, Kostic, Ivan

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The AZ 5214E Resist in EBDW Lithography and its Use as a RIE Etch–Mask in Etching Thin Ag Layers in N2 Plasma by Andok, Robert, Benčurová, Anna, Nemec, Pavol, Konečníková, Anna, Matay, Ladislav, Škriniarová, Jaroslava, Hrkút, Pavol

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