Advanced SOI CMOS transistor technologies for high-performance microprocessor applications by Horstmann, M., Wei, A., Hoentschel, J., Feudel, T., Scheiper, T., Stephan, R., Gerhadt, M., Krugel, S., Raab, M.

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A Plasma Damage Mitigation Concept for SOI Technologies: Lightning Rods by Pelella, Mario M., Zhou, JR, Eppes, David, Leary, Mike, Hale, Stephen, Noorlag, Date, Bullard, Larry, Huebler, Peter, Schuler, Stefan, Dreizner, Andreas, Working, Jim, Chan, Darin, Schwan, Christoph, Horstmann, Manfred, En, Bill, Wieczorek, Karsten, Greenlaw, David, Heidel, Thomas, Heinig, Volker, Miethke, John, Kepler, Nick, Kruegel, Stephan, Frohberg, Kai, Rivers, Jason, Heller, Thomas, Richter, Ralf, Rodriguez, Norma, Klein, Rich

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An Online Multicriteria—Spatial Decision Support System for Public Services Planning by Krügel, Falko, Mäs, Stephan, Hindorf, Paul, Buthmann, Erik

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Loss of collagen-receptor DDR1 delays renal fibrosis in hereditary type IV collagen disease by Gross, Oliver, Girgert, Rainer, Beirowski, Bogdan, Kretzler, Matthias, Kang, Hee Gyung, Kruegel, Jenny, Miosge, Nicolai, Busse, Ann-Christin, Segerer, Stephan, Vogel, Wolfgang F., Müller, Gerhard-Anton, Weber, Manfred

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Endogenous purinergic signaling is required for osmotic volume regulation of retinal glial cells by Wurm, Antje, Lipp, Stephan, Pannicke, Thomas, Linnertz, Regina, Krügel, Ute, Schulz, Angela, Färber, Katrin, Zahn, Dirk, Grosse, Johannes, Wiedemann, Peter, Chen, Ju, Schöneberg, Torsten, Illes, Peter, Reichenbach, Andreas, Bringmann, Andreas

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Advanced SOI CMOS transistor technology for high performance microprocessors by Horstmann, M., Wiatr, M., Wei, A., Hoentschel, J., Feudel, Th, Scheiper, Th, Stephan, R., Gerhadt, M., Krügel, S., Raab, M.

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SOI and low-K in high-volume manufacturing by GREENLAW, D, BURBACH, G, HUEBLER, P, KIRSCH, R, KRUEGEL, S, LANGER, E, PAWLOWITSCH, A, RUELKE, H, SCHUEHRER, H, STEPHAN, R, WEI, A, WERNER, T, FEUDEL, T, WIECZOREK, K, RAAB, M, FEUSTEL, F, FROHBERG, K, GRAETSCH, F, GRASSHOFF, G, HARTIG, C, HEMPEL, K, HORSTMANN, M

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Taking SOI substrates and low-k dielectrics into high-volume microprocessor production by Greenlaw, D., Burbach, G., Feudel, T., Feustel, F., Frohberg, K., Graetsch, F., Grasshoff, G., Hartig, C., Heller, T., Hempel, K., Horstmann, M., Huebler, P., Kirsch, R., Kruegel, S., Langer, E., Pawlowitsch, A., Ruelke, H., Schuehrer, H., Stephan, R., Wei, A., Werner, T., Wieczorek, K., Raab, M.

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