Minimization of Particle Deposition on Wafers Caused by the Pressure Change in the Vacuum Chamber Through a Pressure Control Regulation Process by Ku, Ching-Ming, Yea Jang, Wen, Cheng, Stone

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Factor Design for the Oxide Etching Process to Reduce Edge Particle Contamination in Capacitively Coupled Plasma Etching Equipment by Ku, Ching-Ming, Cheng, Stone

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Modification of discharge sequences to control the random dispersion of flake particles during wafer etching by Ku, Ching Ming, Jang, Wen Yea, Cheng, Stone

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Implementation of a PLL-based high frequency resonant ac power supply by Pao-Chuan Lin, Ying-Ying Ku, Ching-Ming Lai, Yi-Hung Liao, Yi-Shuo Huang

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Web tension control of a start-up process using observer techniques with friction and inertia compensation by Ku Chin Lin, Ming-Ching Tsai, Kung-Yi Chen

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Using Automatic Frequency Shifting Techniques for LLC-SRC Output Voltage Regulation by Kuo-Kai Shyu, Ching-Ming Lai, Ko-Wen Jwo, Ming-Ho Pan, Chung-Ping Ku

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Characterization of pancreatic stem cells derived from adult human pancreas ducts by fluorescence activated cell sorting by Lin, Han-Tso, Chiou, Shih-Hwa, Kao, Chung-Lan, Shyr, Yi-Ming, Hsu, Chien-Jen, Tarng, Yih-Wen, Ho, Larry L-T, Kwok, Ching-Fai, Ku, Hung-Hai

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