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Advanced Atomic-scale Insights into the Chemical Mechanical Polishing Process with Ceria Abrasives using Molecular Dynamics and Neural Network Potential
by
Okuno, Yoshishige
,
Hirakawa, Teruo
,
Ota, Fukiko
,
Kurata, Yuuto
,
Orita, Akihiro
,
Nomura, Satoyuki
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Conference Proceedings
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Abrasives
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Catalysts
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Ceria
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Cerium Oxides
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Chemical Mechanical Polishing
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Chemical-Mechanical Polishing
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Electronic Components
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Electronics Industry
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Engineering
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Engineering, Electrical & Electronic
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Engineering, Mechanical
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Fabrication
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Geometry
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Hydrolysis
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Hydroxyl Groups
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Materials Science
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Materials Science, Multidisciplinary
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Molecular Dynamics
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Neural Network Potential
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Neural Networks
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Ieee Electronic Library (Iel) Conference Proceedings
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