Highly reliable enhanced nitride interface process of barrier low-k using ultra-thin SiN with moisture blocking capability by Usami, Tatsuya, Miura, Yukio, Nakamura, Tomoyuki, Tsuchiya, Hideaki, Kobayashi, Chikako, Ohto, Koichi, Hiroshima, Shoichi, Tanaka, Mikio, Kunishima, Hiroyuki, Ishizuka, Issei, Kuwajima, Teruhiro, Sakurai, Michio, Yokogawa, Shinji, Fujii, Kunihiro

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