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Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer on multicrystalline silicon solar cells
by
van der Werf, C.H.M.
,
Goldbach, H.D.
,
Löffler, J.
,
Scarfó, A.
,
Kylner, A.M.C.
,
Stannowski, B.
,
ArnoldBik, W.M.
,
Weeber, A.
,
Rieffe, H.
,
Soppe, W.J.
,
Rath, J.K.
,
Schropp, R.E.I.
Published in
Thin solid films
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Hot-wire chemical vapor deposition of silicon nitride for multicrystalline silicon solar cells
by
Goldbach, H.D.
,
van der Werf, C.H.M.
,
Loffler, J.
,
Scarfo, A.
,
Kylner, A.M.C.
,
Stannowski, B.
,
ArnoldBik, W.M.
,
Weeber, A.
,
Rieffe, H.
,
Soppe, W.J.
,
Rath, J.K.
,
Schropp, R.E.I.
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Conference Proceeding
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Thin Solid Films
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Chemical Vapor Deposition
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Passivation
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Abscheidungsgeschwindigkeit
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Antireflection
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Antireflexschicht
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Applied Sciences
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Brechungsindex
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Chemisches Aufdampfen
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Methods Of Deposition Of Films And Coatings; Film Growth And Epitaxy
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