Role of ionic strength in chemical mechanical polishing of silicon carbide using silica slurries by Lagudu, Uma Rames Krishna, Isono, Shintaro, Krishnan, Sitaraman, Babu, S.V.

Get full text

Role of Potassium Permanganate-Based Solutions in Controlling the Galvanic Corrosion at Al-Co Interface by Krishna Lagudu, Uma Rames, Chockalingam, Ashwin M., Eckonomikos, Laertis, Babu, S. V.

Get full text

Chemical Mechanical Polishing of Al-Co Films for Replacement Metal Gate Applications by Lagudu, Uma Rames Krishna, Chockalingam, Ashwin M., Babu, S. V.

Get full text

Development of Post-CMP Cleaners for Better Defect Performance by Tran, Cuong, Zhang, Peng, Sun, Laisheng, Penta, Naresh K., Lagudu, Uma Rames K., Shipp, Devon, Babu, S.V

Get full text

Single Particle Inductively Coupled Plasma Mass Spectrometry Study of Ceria Nanoparticle Size Distribution from Oxide CMP with Microreplicated Pads by Zazzera, Larry, Chan, Qilin, Stomberg, Jaimie, Simpson, Alexander, Loesch, Chris, LeHuu, Duy, Muradian, David, Lagudu, Uma Rames Krishna, Mader, Brian

Get full text

Effect of Transition Metal Compounds on Amorphous SiC Removal Rates by Lagudu, Uma Rames Krishna, Babu, S. V.

Get full text

Potassium Periodate-Based Solutions for Minimizing Galvanic Corrosion at the Cu-Mn Interface and for Polishing the Associated Cu Interconnect Structures by Chockalingam, Ashwin M., Lagudu, Uma Rames K., Babu, S. V.

Get full text

Chemical Mechanical Polishing for Extreme Ultraviolet Lithography Mask Substrates by Amanapu, Hari Prasad, Lagudu, Uma Rames, Teki, Ranganath, John-Kadaksham, Arun, Babu, Suryadevara V.

Get full text