Characterization by atomic force microscopy of the SOI layer topography in low-dose SIMOX materials by Guilhalmenc, C., Moriceau, H., Aspar, B., Auberton-Hervé, A.J., Lamure, J.M.

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Defects in SIMOX structures: some process dependence by Margail, J., Lamure, J.M., Papon, A.M.

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Buried oxide layers formed by low dose SIMOX processes by Aspar, B., Guilhalmenc, C., Pudda, C., Garcia, A., Papon, A.M., Auberton-Herve, A.J., Lamure, J.M.

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Characterization of oxygen-ion-implanted silicon using spectroscopic ellipsometry and transmission electron microscopy by Lynch, S., Creen, G.M., Greef, R., Margail, J., Lamure, J.M., Stoemenos, J.

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A novel pattern transfer process for bonded SOI giga-bit DRAMs by Lee, B.H., Bae, G.J., Lee, K.W., Cha, G., Kim, W.D., Lee, S.I., Barge, T., Auberton-Herve, A.J., Lamure, J.M.

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"Smart cut": a promising new SOI material technology by Bruel, M., Aspar, B., Charlet, B., Maleville, C., Poumeyrol, T., Soubie, A., Auberton-Herve, A.J., Lamure, J.M., Barge, T., Metral, F., Trucchi, S.

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SIMOX material: from research to production by Lamure, J.M., Biasse, B., Jaussaud, C., Papon, A.M., Michaud, J.F., Gusella, F., Pudda, C., Cartier, A.M., Soubie, A., Margail, J.

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Impact of Influenza B in France by Lamure, M, Cohen, J.M, Pribil, C, Garassus, P, Auray, J, Fleming, D, Pujol, P

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PRM66 - Impact of Influenza B in France by Lamure, M., Cohen, J.M., Pribil, C., Garassus, P., Auray, J., Fleming, D., Pujol, P

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