Search Results - Lassig, S.E.

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    Effects of processing pressure on device damage in RF biased ECR CVD

    Effects of processing pressure on device damage in RF biased ECR CVD by Lassig, S.E., Vahedi, V., Benjamin, N., Mulgrew, P., Gottscho, R.

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    Profile simulation of plasma enhanced and ECR oxide deposition with sputtering

    Profile simulation of plasma enhanced and ECR oxide deposition with sputtering by Chang, C.Y., McVittie, J.P., Li, J., Saraswat, K.C., Lassig, S.E., Dong, J.

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