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Formation of High-Temperature Stable Co-Silicide from Co 0.92 Ta 0.08 /Si Systems
by
Lee, Deok-Hyung
,
Ko, Dae-Hong
,
Ku, Ja-Hum
,
Choi, Siyoung
,
Fujihara, Kazuyuki
,
Kang, Ho-Kyu
,
Oh, Sang-Ho
,
Park, Chan-Gyung
,
Lee, Hoo-Jeung
Published in
Japanese Journal of Applied Physics
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Japanese Journal Of Applied Physics
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Institute Of Physics
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