Search Results - Lepadatu, A.M.

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  1. 1
    Influence of in-situ hydrogenation on photoelectrical properties of amorphous and nanocrystalline GeSn deposited by magnetron sputtering

    Influence of in-situ hydrogenation on photoelectrical properties of amorphous and nanocrystalline GeSn deposited by magnetron sputtering by Dascalescu, I., Palade, C., Lungu, G.A., Lepadatu, A.M., Teodorescu, V.S., Braic, M., Ciurea, M.L., Stoica, T., Slav, A.

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  2. 2
    Orthorhombic HfO2 with embedded Ge nanoparticles in nonvolatile memories used for the detection of ionizing radiation

    Orthorhombic HfO2 with embedded Ge nanoparticles in nonvolatile memories used for the detection of ionizing radiation by Palade, C, Slav, A, Lepadatu, A M, Stavarache, I, Dascalescu, I, Maraloiu, A V, Negrila, C, Logofatu, C, Stoica, T, Teodorescu, V S, Ciurea, M L, Lazanu, S

    Published in Nanotechnology
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  3. 3
    Material parameters from frequency dispersion simulation of floating gate memory with Ge nanocrystals in HfO2

    Material parameters from frequency dispersion simulation of floating gate memory with Ge nanocrystals in HfO2 by Palade, C., Lepadatu, A.M., Slav, A., Lazanu, S., Teodorescu, V.S., Stoica, T., Ciurea, M.L.

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  4. 4
    How morphology determines the charge storage properties of Ge nanocrystals in HfO2

    How morphology determines the charge storage properties of Ge nanocrystals in HfO2 by Slav, A., Palade, C., Lepadatu, A.M., Ciurea, M.L., Teodorescu, V.S., Lazanu, S., Maraloiu, A.V., Logofatu, C., Braic, M., Kiss, A.

    Published in Scripta materialia
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  5. 5
    How morphology determines the charge storage properties of Ge nanocrystals in HfO 2

    How morphology determines the charge storage properties of Ge nanocrystals in HfO 2 by Slav, A., Palade, C., Lepadatu, A.M., Ciurea, M.L., Teodorescu, V.S., Lazanu, S., Maraloiu, A.V., Logofatu, C., Braic, M., Kiss, A.

    Published in Scripta materialia
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  6. 6
    Controlling SWIR photosensitivity limit by composition engineering: from Ge to GeSi nanocrystals embedded in TiO2

    Controlling SWIR photosensitivity limit by composition engineering: from Ge to GeSi nanocrystals embedded in TiO2 by Dascalescu, I., Cojocaru, O., Lalau, I., Palade, C., Slav, A., Lepadatu, A.M., Lazanu, S., Stoica, T., Ciurea, M.L.

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  7. 7
    Percolation Phenomena in Silicon - Based Nanocrystalline Systems

    Percolation Phenomena in Silicon - Based Nanocrystalline Systems by Lepadatu, A.M., Rusnac, E., Stavarache, I.

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