Direct Emissions Reduction in Plasma Dry Etching Using Alternate Chemistries: Opportunities, Challenges, and Need for Collaboration by Lugani, Gurpreet S., Skaggs, Robert, Morris, Bryan, Tolman, Tyler, Tervo, Douglas, Uhlenbrock, Stefan, Hacker, Jon, Seng Tan, Chye, Nehlsen, James P., Ridgeway, Robert G., Wong Broadway, Lois, Rudy, Francis P.

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