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    X-ray spectroscopic examination of thin Hf[O.sub.2] films ALD- and MOCVD-grown on the Si surface

    X-ray spectroscopic examination of thin Hf[O.sub.2] films ALD- and MOCVD-grown on the Si surface by Sokolov, A.A, Ovchinnikov, A.A, Lysenkov, K.M, Marchenko, D.E, Filatova, E.O

    Published in Technical physics
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