Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography by Zidan, Mohamed, Fischer, Daniel, Severi, Joren, De Simone, Danilo, Moussa, Alain, Müllender, Angelika, Mack, Chris, Charley, Anne-Laure, Leray, Philippe, De Gendt, Stefan, Lorusso, Gian Francesco

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