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Synthesis and characterization of low pressure chemically vapor deposited titanium nitride films using TiCl4 and NH3
by
RAMANUJA, N
,
LEVY, R. A
,
DHARMADHIKARI, S. N
,
RAMOS, E
,
PEARCE, C. W
,
MENASIAN, S. C
,
SCHAMBERGER, P. C
,
COLLINS, C. C
Published in
Materials letters
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Experiment with stored 0.7-MeV ions: observation of stability properties of a nonthermal plasma
by
AL SALAMEH, D
,
CHANNON, S
,
CHEO, B. R
,
LEVERTON, R
,
MAGLICH, B. C
,
MENASIAN, S
,
MILLER, R. A
,
NERING, J
,
WU, C. Y
Published in
Physical review letters
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Synthesis and characterization of low pressure chemically vapor deposited titanium nitride films using TiCl 4 and NH 3
by
Ramanuja, N
,
Levy, R.A
,
Dharmadhikari, S.N
,
Ramos, E
,
Pearce, C.W
,
Menasian, S.C
,
Schamberger, P.C
,
Collins, C.C
Published in
Materials letters
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Titanium Nitride Films
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Cross-Disciplinary Physics: Materials Science; Rheology
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Magnetic Confinement And Equilibrium
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Methods Of Deposition Of Films And Coatings; Film Growth And Epitaxy
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