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Effect of Amine Additives on LWR and LER as Studied by Extraction Parameters
by
Houlihan, Francis M.
,
Rentkiewicz, David
,
Lin, Guanyang
,
Rahman, Dalil
,
Mackenzie, Dougls
,
Timko, Allen
,
Kudo, Takanori
,
Anyadiegwu, Clement
,
Thiyqarqjan, Muthiah
,
Chiu, Simon
,
Romano, Andrew
,
Dammel, Rqlph R.
,
Padmanaban, Murirathna
Published in
Journal of Photopolymer Science and Technology
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Journal Of Photopolymer Science And Technology
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Subjects
193 Nm Lithography
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193 Resist
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Amines
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Base
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Basicity
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Extraction
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Hydrophilicity
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Ler
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Light Water Reactors
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Lwr
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Photopolymers
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Physical Sciences
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Polymer Science
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Roughness
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Science & Technology
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Full-Text Journals In Chemistry (Open Access)
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Ezb-Free-00999 Freely Available Ezb Journals
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