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Relationship between Tg of Polyimide Resin and Resist Sensitivity in Three-Component Chemically Amplified Polyimide Resist
by
Madokoro, Daiki
,
Takashima, Katsuaki
,
Tanaka, Susumu
,
Yamaoka, Kohei
,
Yuba, Tomoyuki
,
Horibe, Hideo
Published in
Journal of Photopolymer Science and Technology
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Journal Of Photopolymer Science And Technology
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Acid Diffusion
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Chemically Amplified Resist
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Deprotection Reaction
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Physical Sciences
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Polyimide Resist
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Polymer Science
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Science & Technology
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