Search Results - Maeda, Itsumi

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  1. 1
    Real-Time Visualization of CO2 Generated by Corrosion of the Carbon Support in a PEFC Cathode

    Real-Time Visualization of CO2 Generated by Corrosion of the Carbon Support in a PEFC Cathode by Ishigami, Yuta, Maeda, Itsumi, Takada, Kenji, Hyakutake, Tsuyoshi, Suga, Takeo, Inukai, Junji, Uchida, Makoto, Nagumo, Yuzo, Nishide, Hiroyuki, Watanabe, Masahiro

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  2. 2
    Thermal dissociation process of hydrogen atoms in plasma-enhanced chemical vapor deposited silicon nitride films

    Thermal dissociation process of hydrogen atoms in plasma-enhanced chemical vapor deposited silicon nitride films by Maeda, Masahiko, Itsumi, Manabu

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  3. 3
    Stress evaluation of chemical vapor deposited silicon dioxide films

    Stress evaluation of chemical vapor deposited silicon dioxide films by Maeda, Masahiko, Itsumi, Manabu

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  4. 4
    Dependence of the density of defects in the oxide on Czochralski silicon on its thickness

    Dependence of the density of defects in the oxide on Czochralski silicon on its thickness by Itsumi, Manabu, Maeda, Masahiko, Ueki, Takemi

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  5. 5
    Oxide ridge formed around octahedral void defects on (001)-oriented Czochralski silicon

    Oxide ridge formed around octahedral void defects on (001)-oriented Czochralski silicon by Itsumi, Manabu, Maeda, Masahiko, Ueki, Takemi, Tazawa, Satoshi

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  6. 6
    Two Kinds of Impurity-related Mark on Thermal Oxides Originating in Octahedral Void Defects

    Two Kinds of Impurity-related Mark on Thermal Oxides Originating in Octahedral Void Defects by Itsumi, Manabu, Maeda, Masahiko, Ohfuji, Shin-ichi, Ueki, Takemi

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  7. 7
    Dielectric characteristics of a metal–insulator–metal capacitor using plasma-enhanced chemical vapor deposited silicon nitride films

    Dielectric characteristics of a metal–insulator–metal capacitor using plasma-enhanced chemical vapor deposited silicon nitride films by Maeda, Masahiko, Yamamoto, Ei-ichi, Ohfuji, Shin-ichi, Itsumi, Manabu

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  8. 8
    Water-assisted repair of plasma-induced damage in the silicon/silicon-dioxide system

    Water-assisted repair of plasma-induced damage in the silicon/silicon-dioxide system by Itsumi, Manabu, Maeda, Masahiko, Takeuchi, Hideaki, Morie, Takashi

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  9. 9
    Measurements of atomic hydrogen-density profiles in the RFC-XX-M machine using laser fluorescence spectroscopy at the Hα transition

    Measurements of atomic hydrogen-density profiles in the RFC-XX-M machine using laser fluorescence spectroscopy at the Hα transition by MURAOKA, K, UCHINO, K, AOKI, T, FUJITA, H, HATTORI, K, HIDEKUMA, S, OKUBO, Y, SATO, T, GARNER, H. R, BAKER, D. R, PRICE, H. D, ITSUMI, Y, HAMAMOTO, M, MAEDA, M, AKAZAKI, M, KAWAMOTO, T, KUMAZAWA, R, OKAMURA, S, ADATI, K

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  10. 10
    Developments and applications of laser-fluorescence for studies of particle-behaviours in plasma-surface interactions

    Developments and applications of laser-fluorescence for studies of particle-behaviours in plasma-surface interactions by Muraoka, K., Maeda, M., Okada, T., Honda, C., Hamamoto, M., Uchino, K., Kajiwara, T., Matsuda, Y., Itsumi, Y., Akazaki, M., Kawamoto, T., Kumazawa, R., Okamura, S., Garner, H.R.

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