Search Results - Magoon, Holly

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  1. 1
    Etch adjustment for independent CD control in Double Patterning

    Etch adjustment for independent CD control in Double Patterning by Barnola, S., Lapeyre, C., Servin, I., McCallum, M., Magoon, H.

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    Immersion Lithography Ready for 45 nm Manufacturing and Beyond

    Immersion Lithography Ready for 45 nm Manufacturing and Beyond by Owa, Soichi, Nakano, Katsushi, Nagasaka, Hiroyuki, Fujiwara, Tomoharu, Matsuyama, Tomoyuki, Ohmura, Yasuhiro, Magoon, Holly

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    Scanner focus and CD response characterization metrology for sub 180nm lithography

    Scanner focus and CD response characterization metrology for sub 180nm lithography by PUTNAM, Christopher, MAGOON, Holly, ALAM, Muhammad, BEAUMONT, Shelley, FRUGA, Catherine, LEUNG, Frank, MORITA, Etsuya, PIERCE, Ronald, ROBERTS, Norman

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