Search Results - Mahorowala, Arpan P.

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  1. 1
    Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes

    Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes by Goldfarb, Dario L., Mahorowala, Arpan P., Gallatin, Gregg M., Petrillo, Karen E., Temple, Karen, Angelopoulos, Marie, Rasgon, Stacy, Sawin, Herbert H., Allen, Scott D., Lawson, Margaret C., Kwong, Ranee W.

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  2. 2
    Etching of polysilicon in inductively coupled Cl2 and HBr discharges. II. Simulation of profile evolution using cellular representation of feature composition and Monte Carlo computation of flux and surface kinetics

    Etching of polysilicon in inductively coupled Cl2 and HBr discharges. II. Simulation of profile evolution using cellular representation of feature composition and Monte Carlo compu... by Mahorowala, Arpan P., Sawin, Herbert H.

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  3. 3
    Etching of polysilicon in inductively coupled Cl2 and HBr discharges. III. Photoresist mask faceting, sidewall deposition, and microtrenching

    Etching of polysilicon in inductively coupled Cl2 and HBr discharges. III. Photoresist mask faceting, sidewall deposition, and microtrenching by Mahorowala, Arpan P., Sawin, Herbert H.

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  4. 4
    Etching of polysilicon in inductively coupled Cl2 and HBr discharges. IV. Calculation of feature charging in profile evolution

    Etching of polysilicon in inductively coupled Cl2 and HBr discharges. IV. Calculation of feature charging in profile evolution by Mahorowala, Arpan P., Sawin, Herbert H.

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  5. 5
    Etching of polysilicon in inductively coupled Cl2 and HBr discharges. I. Experimental characterization of polysilicon profiles

    Etching of polysilicon in inductively coupled Cl2 and HBr discharges. I. Experimental characterization of polysilicon profiles by Mahorowala, Arpan P., Sawin, Herbert H., Jones, Richard, Labun, Andrew H.

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  6. 6
    Etching of polysilicon in inductively coupled Cl 2 and HBr discharges. II. Simulation of profile evolution using cellular representation of feature composition and Monte Carlo computation of flux and surface kinetics

    Etching of polysilicon in inductively coupled Cl 2 and HBr discharges. II. Simulation of profile evolution using cellular representation of feature composition and Monte Carlo comp... by Mahorowala, Arpan P., Sawin, Herbert H.

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  7. 7
    Etching of polysilicon in inductively coupled Cl 2 and HBr discharges. III. Photoresist mask faceting, sidewall deposition, and microtrenching

    Etching of polysilicon in inductively coupled Cl 2 and HBr discharges. III. Photoresist mask faceting, sidewall deposition, and microtrenching by Mahorowala, Arpan P., Sawin, Herbert H.

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  8. 8
    Etching of polysilicon in inductively coupled Cl 2 and HBr discharges. IV. Calculation of feature charging in profile evolution

    Etching of polysilicon in inductively coupled Cl 2 and HBr discharges. IV. Calculation of feature charging in profile evolution by Mahorowala, Arpan P., Sawin, Herbert H.

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  9. 9
    Etching of polysilicon in inductively coupled Cl 2 and HBr discharges. I. Experimental characterization of polysilicon profiles

    Etching of polysilicon in inductively coupled Cl 2 and HBr discharges. I. Experimental characterization of polysilicon profiles by Mahorowala, Arpan P., Sawin, Herbert H., Jones, Richard, Labun, Andrew H.

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