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Temperature analysis of Si0.55Ge0.45 sourced nanowire tunnel field-effect transistor based on charge plasma and gate stack
by
Mahto, Chetlal
,
Sharma, Prithvi Raj
,
Nishad, Siddharth Kumar
,
Kumar, Shubham
,
Singh, Navaneet Kumar
,
Singh, Shradhya
,
Kar, Rajib
,
Mandal, Durbadal
Published in
Applied physics. A, Materials science & processing
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Applied Physics. A, Materials Science & Processing
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Applied Physics
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Characterization And Evaluation Of Materials
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Charge Plasma
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Condensed Matter Physics
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Electric Fields
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Energy Bands
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Field Effect Transistors
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Gate Stacking
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Machines
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Manufacturing
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Materials Science
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Materials Science, Multidisciplinary
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Mole Fraction
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Nanotechnology
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Nanowire
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