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Evaluation of Cross-Contamination Risk during CMOS Devices Fabrication in an Industrial Silicon Wafer Processing
by
Zulkefli, Amir
,
Umar, Ismail
,
Manaoogaran, Vanita
,
Hidayatulhusna, Wan
,
Kai, Oh Guan
,
Samail, Deyline
,
Iskandar, Izzuddin
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Conference Proceedings
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Arsenic
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Chemical Etching
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Cmos
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Cmos Smart Power Device
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Containment
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Containment Action
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Contamination
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Cross Contamination Risk
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Electrical Faults
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Fabrication
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Fabrication Facility
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High Temperature
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Integrated Circuits
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Ion Implantation
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Mass Production
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Nanoelectronics
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Power Semiconductor Devices
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Production Lines
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Silicon Wafers
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Surface Contamination
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Ieee Electronic Library (Iel) Conference Proceedings
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