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Influence of pressure and annealing on the microstructural and electro-optical properties of RF magnetron sputtered ITO thin films
by
Cruz, L.R
,
Legnani, C
,
Matoso, I.G
,
Ferreira, C.L
,
Moutinho, H.R
Published in
Materials research bulletin
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Journal Title
Materials Research Bulletin
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Subjects
A. Thin Films
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Absorption
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Annealing
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B. Sputtering
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D. Electrical Properties
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D. Microstructure
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D. Optical Properties
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Deposition
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Electrical Properties
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Magnetrons
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Materials Science
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Microstructure
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Optical Properties
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Pressure Dependence
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Sputtering
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Temperature Range 0273-0400 K
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Thin Films
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Tin Oxides
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Sciencedirect Journals
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Backfile Package - Materials Science [Yms]
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