Metrology and inspection required for next generation lithography by Asano, Masafumi, Yoshikawa, Ryoji, Hirano, Takashi, Abe, Hideaki, Matsuki, Kazuto, Tsuda, Hirotaka, Komori, Motofumi, Ojima, Tomoko, Yonemitsu, Hiroki, Kawamoto, Akiko

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Printability of defects in Talbot lithography by Sato, Takashi, Yamada, Akiko, Suto, Takeshi, Inanami, Ryoichi, Matsuki, Kazuto, Ito, Shinichi

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High-Accuracy Proximity Effect Correction for Mask Writing by Abe, Takayuki, Hattori, Yoshiaki, Iijima, Tomohiro, Anze, Hirohito, Oogi, Susumu, Kamikubo, Takashi, Tsuchiya, Seiichi, Shimizu, Matsuki, Kazuto, Inoue, Hideo, Tojo, Takigawa, Tadahiro

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Development of simultaneous image acquisition optics with transmitted and reflected light for 45nm (hp) node mask inspection by Hirano, R., Yamashita, K., Ohira, K., Matsuki, K., Isomura, J., Ogawa, R., Kikuiri, N., Terasawa, T.

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Prognostic value and clinicopathological roles of the tumor immune microenvironment in salivary duct carcinoma by Hirai, Hideaki, Nakaguro, Masato, Tada, Yuichiro, Saigusa, Natsuki, Kawakita, Daisuke, Honma, Yoshitaka, Kano, Satoshi, Tsukahara, Kiyoaki, Ozawa, Hiroyuki, Okada, Takuro, Okami, Kenji, Yamazaki, Keisuke, Sato, Yukiko, Urano, Makoto, Kajiwara, Manami, Utsumi, Yoshitaka, Shimura, Tomotaka, Fushimi, Chihiro, Shimizu, Akira, Kondo, Takahito, Imanishi, Yorihisa, Sakai, Akihiro, Sato, Yuichiro, Togashi, Takafumi, Hanazawa, Toyoyuki, Matsuki, Takashi, Yamazaki, Kazuto, Nagao, Toshitaka

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Study of a Negative Threshold Voltage Shift in Positive Bias Temperature Instability and a Positive Threshold Voltage Shift the Negative Bias Temperature Instability of Yttrium-Dop... by Sato, Motoyuki, Kamiyama, Satoshi, Matsuki, Takeo, Ishikawa, Dai, Ono, Tetsuro, Morooka, Tetsu, Yugami, Jiro, Ikeda, Kazuto, Ohji, Yuzuru

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Transformation of Crystalline Structure of HfO 2 by La- or Y-Oxide Capping and Annealing by Suzuki, Takayuki, Matsuki, Takeo, Morooka, Tetsu, Sato, Motoyuki, Yugami, Jiro, Ikeda, Kazuto, Ohji, Yuzuru

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Study of a Negative Threshold Voltage Shift in Positive Bias Temperature Instability and a Positive Threshold Voltage Shift the Negative Bias Temperature Instability of Yttrium-Dop... by Sato, Motoyuki, Kamiyama, Satoshi, Matsuki, Takeo, Ishikawa, Dai, Ono, Tetsuro, Morooka, Tetsu, Yugami, Jiro, Ikeda, Kazuto, Ohji, Yuzuru

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(Invited) Negatively Charged Defects Generated by Rare-Earth Materials Incorporation into HfO 2 and the Impact on the Gate Dielectrics Reliability by Sato, Motoyuki, Kamiyama, Satoshi, Sugita, Yoshihiro, Matsuki, Takeo, Morooka, Tetsu, Suzuki, Takayuki, Shiraishi, Kenji, Yamabe, Kikuo, Yugami, Jiro, Ikeda, Kazuto, Ohji, Yuzuru, Ohmori, Kenji, Yamada, Keisaku

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Negatively charged deep level defects generated by Yttrium and Lanthanum incorporation into HfO2 for Vth adjustment, and the impact on TDDB, PBTI and 1/f noise by Sato, M., Kamiyama, S., Sugita, Y., Matsuki, T., Morooka, T., Suzuki, T., Shiraishi, K., Yamabe, K., Ohmori, K., Yamada, K., Yugami, J., Ikeda, K., Ohji, Y.

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