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Conformal aluminum oxide coating of high aspect ratio structures using metalorganic chemical vapor deposition
by
Wiest, F.
,
Capodieci, V.
,
Blank, O.
,
Gutsche, M.
,
Schulze, J.
,
Eisele, I.
,
Matusche, J.
,
Schmidt, U.I.
Published in
Thin solid films
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Activity Coefficients at Infinite Dilution and Excess Molar Volumes in Binary Mixtures Containing Normal Alkanes (Nonane, Decane, Undecane, or Dodecane) and Cresols (2-Methylphenol...
by
Schmelzer, Juergen
,
Grenner, Andreas
,
Matusche, Jan
,
Brettschneider, Gabi
,
Anderson, Joerg
,
Niederbroeker, Heike
Published in
Journal of chemical and engineering data
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Effect of PECVD SiC and SiCN cap layer deposition on mesoporous silica ultra low k dielectric films
by
Schulz, S.E.
,
Schulze, K.
,
Matusche, J.
,
Schmidt, U.
,
Gessner, T.
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Conference Proceeding
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Manufacturing implementation of low-k dielectrics for copper damascene technology
by
Ruelke, H.
,
Streck, C.
,
Hohage, J.
,
Weiher-Telford, S.
,
Chretrien, O.
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Water-soluble photoresins based on polymeric azo compounds
by
Matusche, P.
,
Nuyken, O.
,
Voit, B.
,
Van Damme, M.
,
Vermeersch, J.
,
De Winter, W.
,
Alaerts, L.
Published in
Reactive polymers
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