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Post‐Assembly Photomasking of Potassium Acyltrifluoroborates (KATs) for Two‐Photon 3D Patterning of PEG‐Hydrogels
by
Song, Haewon
,
Wu, Dino
,
Mazunin, Dimitry
,
Liu, Sizhou M.
,
Sato, Yoshikatsu
,
Broguiere, Nicolas
,
Zenobi‐Wong, Marcy
,
Bode, Jeffrey W.
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Helvetica chimica acta
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Helvetica Chimica Acta
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3D Photopatterning
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Chemical Reactions
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Chemistry
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Chemistry, Multidisciplinary
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Functional Groups
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Hydrogel
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Hydrogels
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Hydroxylamine
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Irradiation
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Kat Ligation
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Light Irradiation
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Photochemistry
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Photons
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Physical Sciences
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Potassium
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Protecting Groups
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Radiation
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