Metal Adsorption Controls Stability of Layered Manganese Oxides by Yang, Peng, Post, Jeffrey E, Wang, Qian, Xu, Wenqian, Geiss, Roy, McCurdy, Patrick R, Zhu, Mengqiang

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Nitric Acid−Water Complexes:  Theoretical Calculations and Comparison to Experiment by McCurdy, Patrick R, Hess, Wayne P, Xantheas, Sotiris S

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Studies of Electrochemically Transformed Ferritin Adsorbed at Tin-Doped Indium Oxide Electrodes Using X-ray Photoelectron Spectroscopy by Martin, Kevin C, Villano, Stephanie M, McCurdy, Patrick R, Zapien, Donald C

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Surface Interactions of NH2 Radicals in NH3 Plasmas by McCurdy, Patrick R, Butoi, Carmen I, Williams, Keri L, Fisher, Ellen R

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Investigation of the PECVD TiO 2–Si(1 0 0) interface by McCurdy, Patrick R, Sturgess, Laura J, Kohli, Sandeep, Fisher, Ellen R

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Investigation of the PECVD TiO2-Si(1 0 0) interface by MCCURDY, Patrick R, STURGESS, Laura J, KOHLI, Sandeep, FISHER, Ellen R

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Isoelectric points of plasma-modified and aged silicon oxynitride surfaces measured using contact angle titrations by Trevino, Kristina J., Shearer, Jeffrey C., McCurdy, Patrick R., Pease-Dodson, Shannon E., Okegbe, Christabel C., Fisher, Ellen R.

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Effect of Annealing on the Interfacial and Structural Properties of Amorphous Silicon-Hafnia Films by Kohli, Sandeep, McCurdy, Patrick R., Rithner, Christopher D., Dorhout, Peter K., Dummer, Ann M., Menoni, Carmen S.

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Spectroscopic ellipsometry and photoluminescence measurements of as-deposited and annealed silicon rich oxynitride films by Kohli, Sandeep, Theil, Jeremy A., McCurdy, Patrick R., Dippo, Patricia C., Ahrenkiel, Richard K., Rithner, Christopher D., Dorhout, Peter K.

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Surface Reactivity and Plasma Energetics of SiH Radicals during Plasma Deposition of Silicon-Based Materials by Kessels, W. M. M, McCurdy, Patrick R, Williams, Keri L, Barker, G. R, Venturo, Vincent A, Fisher, Ellen R

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Template-Assisted Chemical Vapor Deposited Spinel Ferrite Nanotubes by Kohli, Sandeep, McCurdy, Patrick R., Johnson, Derek C., Das, Jaydip, Prieto, Amy L., Rithner, Christopher D., Fisher, Ellen R.

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Pulsed and continuous wave plasma deposition of amorphous, hydrogenated silicon carbide from SiH4/CH4 plasmas by McCurdy, Patrick R., Truitt, Jason M., Fisher, Ellen R.

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Comparison of Oxidation Rates for a ‐ Si1 − x  C  x  :  H  Films Deposited from Pulsed and Continuous Wave RF Plasmas by McCurdy, Patrick R., Truitt, Jason M., Fisher, Ellen R.

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Microstructural features of cadmium telluride photovoltaic thin film devices by Manivannan, Venkatesan, Enzenroth, Robert A., Barth, Kurt L., Kohli, Sandeep, McCurdy, Patrick R., Sampath, Walajabad S.

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Microstmctural features of cadmium telluride photovoltaic thin film devices by MANIVANNAN, Venkatesan, ENZENROTH, Robert A, BARTH, Kurt L, KOHLI, Sandeep, MCCURDY, Patrick R, SAMPATH, Walajabad S

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X-ray characterization of oriented β-tantalum films by Kohli, Sandeep, McCurdy, Patrick R., Rithner, Christopher D., Dorhout, Peter K., Dummer, Ann M., Brizuela, Fernando, Menoni, Carmen S.

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A modified molecular beam instrument for the imaging of radicals interacting with surfaces during plasma processing by McCurdy, Patrick R., Bogart, K. H. A., Dalleska, N. F., Fisher, Ellen R.

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Ultraviolet photochemistry of hydrogen-bonded HBr⋅acetone complexes in argon matrices by McCurdy, Patrick R., Vorpagel, Erich R., Hess, Wayne P.

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Effect of chemical treatment on the optical properties of a cdte photovoltaic device investigated by spectroscopic ellipsometry by Kohli, S, Manivannan, V, Hilfiker, J N, McCurdy, P R, Enzenroth, R A, Barth, K L, Smith, W P, Luebs, R, Kephart, J, Sampath, W S

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Effect of microstructure on the performance of stressed cadmium telluride photovoltaic (PV) devices by Sampath, W.S., Kohli, S., Enzenroth, R.A., Barth, K.L., Manivannan, V., Smith, W.P., Kobyakov, P., Sathiraju, S., McCurdy, P.R.

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