Numerical analysis of the brittle strength of welded pipelines with corrosion metal loss in the transportation of blends of natural gas with hydrogen by Milenin, Alexey, Velikoivanenko, Elena, Rozynka, Galina, Pivtorak, Nina

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Assessment of STI dry etch process variability by means of dynamic time warping technique by Milenin, Alexey P., Chan, BT, Lazzarino, Frederic

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Novel approach for numerical evaluation of limiting state and reliability of corroded pipelines under in-service repair welding by Milenin, Alexey, Velikoivanenko, Elena, Rozynka, Galina, Pivtorak, Nina

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Study on processing step uniformity tuning during FET fabrication and sensor wafer response as a function of chuck temperature adjustment by Milenin, Alexey P., Boullart, Werner, Quli, Farhat, Wen, Youxian

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A Low-Power HKMG CMOS Platform Compatible With Dram Node 2× and Beyond by Ritzenthaler, Romain, Schram, Tom, Spessot, Alessio, Caillat, Christian, Aoulaiche, Marc, Moon Ju Cho, Kyoung Bong Noh, Son, Yunik, Hoon Joo Na, Kauerauf, Thomas, Douhard, Bastien, Nazir, Aftab, Soon Aik Chew, Milenin, Alexey P., Altamirano-Sanchez, Efrain, Schoofs, Geert, Albert, Johan, Sebai, Farid, Vecchio, Emma, Paraschiv, Vasile, Vandervorst, Wilfried, Sun-Ghil Lee, Collaert, Nadine, Fazan, Pierre, Horiguchi, Naoto, Thean, Aaron Voon-Yew

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Transfer of Sub-30-nm Patterns from Templates Based on Supramolecular Assemblies by Zschech, Danilo, Milenin, Alexey P, Scholz, Roland, Hillebrand, Reinald, Sun, Yiming, Uhlmann, Petra, Stamm, Manfred, Steinhart, Martin, Gösele, Ulrich

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(Invited) Challenges on Surface Conditioning in 3D Device Architectures: Triple-Gate FinFETs, Gate-All-Around Lateral and Vertical Nanowire FETs by Veloso, Anabela, Paraschiv, Vasile, Vecchio, Emma, Devriendt, Katia, Li, Waikin, Simoen, Eddy, Chan, B. T., Tao, Zheng, Rosseel, Erik, Loo, Roger, Milenin, Alexey P., Kunert, Bernardette, Teugels, Lieve, Sebaai, Farid, Lorant, Christophe, van Dorp, Dennis, Altamirano-Sánchez, Efraín, Brus, Stephan, Marien, Philippe, Fleischmann, Claudia, Melkonyan, Davit, Huynh-Bao, Trong, Eneman, Geert, Hellings, Geert, Sibaja-Hernandez, Arturo, Matagne, Philippe, Waldron, Niamh, Mocuta, Dan, Collaert, Nadine

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Application of Cl2 for low temperature etch and epitaxy by Hikavyy, Andriy, Porret, Clement, Rosseel, Erik, Milenin, Alexey, Loo, Roger

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High-temperature resistant, ordered gold nanoparticle arrays by Zschech, Danilo, Kim, Dong Ha, Milenin, Alexey P, Hopfe, Sigrid, Scholz, Roland, Göring, Petra, Hillebrand, Reinald, Senz, Stephan, Hawker, Craig J, Russell, Thomas P, Steinhart, Martin, Gösele, Ulrich

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Application of Cl 2 for low temperature etch and epitaxy by Hikavyy, Andriy, Porret, Clement, Rosseel, Erik, Milenin, Alexey, Loo, Roger

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Visible range whispering-gallery mode in microdisk array based on size-controlled Si nanocrystals by Zhang, Rong-Jun, Seo, Se-Young, Milenin, Alexey P., Zacharias, Margit, Gösele, Ulrich

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Probabilistic procedure for numerical assessment of corroded pipeline strength and operability by Milenin, Alexey, Velikoivanenko, Elena, Rozynka, Galina, Pivtorak, Nina

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Wafer‐Scale Integration of Single Layer Graphene Electro‐Absorption Modulators in a 300 mm CMOS Pilot Line by Wu, Chenghan, Brems, Steven, Yudistira, Didit, Cott, Daire, Milenin, Alexey, Vandersmissen, Kevin, Maestre, Arantxa, Centeno, Alba, Zurutuza, Amaia, Van Campenhout, Joris, Huyghebaert, Cedric, Van Thourhout, Dries, Pantouvaki, Marianna

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64 Gb/s O-band GeSi Quantum-Confined Stark Effect Electro-absorption Modulators integrated in a 300mm Silicon Photonics Platform by Kandeel, Ahmed, Hiblot, Gaspard, Porret, Clement, Srinivasan, Srinivasan Ashwyn, Shimura, Yosuke, Loo, Roger, Berciano, Mathias, Tseng, Chih-Kuo Neil, Malik, Dharmander, Milenin, Alexey, Yudistira, Didit, Balakrishnan, Sadhishkumar, Shahin, Amir, Vaskasi, Javad Rahimi, Verheyen, Peter, Pantouvaki, Marianna, Chakrabarti, Maumita, Velenis, Dimitrios, Ferraro, Filippo, Ban, Yoojin, Van Thourhout, Dries, Van Campenhout, Joris

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Ordered Arrays of 〈100〉-Oriented Silicon Nanorods by CMOS-Compatible Block Copolymer Lithography by Zschech, Danilo, Kim, Dong Ha, Milenin, Alexey P., Scholz, Roland, Hillebrand, Reinald, Hawker, Craig J., Russell, Thomas P., Steinhart, Martin, Gösele, Ulrich

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Record 47 mV/dec top-down vertical nanowire InGaAs/GaAsSb tunnel FETs by Alian, Alireza, Kazzi, Salim El, Verhulst, Anne, Milenin, Alexey, Pinna, Nicolo, Ivanov, Tsvetan, Lin, Dennis, Mocuta, Dan, Collaert, Nadine

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N7 FinFET Self-Aligned Quadruple Patterning Modeling by Baudot, Sylvain, Guissi, Sofiane, Milenin, Alexey P., Ervin, Joseph, Schram, Tom

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(Invited) Selective Etch of Si and SiGe for Gate All-Around Device Architecture by Wostyn, Kurt, Sebaai, Farid, Rip, Jens, Mertens, Hans, Witters, Liesbeth, Loo, Roger, Hikavyy, Andriy Yakovitch, Milenin, Alexey, Horiguchi, Naoto, Collaert, Nadine, Thean, Aaron, Mertens, Paul W., De Gendt, Stefan, Holsteyns, Frank

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Patterning Aspects of SiGe/Ge BFFT Fabrication by Milenin, Alexey, Witters, Liesbeth, Demand, Marc

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Aligned Horizontal Silica Nanochannels by Oxidative Self-Sealing of Patterned Silicon Wafers by Chen, Xin, Ji, Ran, Steinhart, Martin, Milenin, Alexey, Nielsch, Kornelius, Gösele, Ulrich

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