Search Results - Moitreyee, M.R.

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  1. 1
    A comparative study of low dielectric constant barrier layer, etch stop and hardmask films of hydrogenated amorphous Si-(C, O, N)

    A comparative study of low dielectric constant barrier layer, etch stop and hardmask films of hydrogenated amorphous Si-(C, O, N) by Wang, Y.H., Moitreyee, M.R., Kumar, R., Shen, L., Zeng, K.Y., Chai, J.W., Pan, J.S.

    Published in Thin solid films
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  2. 2
    The mechanical properties of ultra-low-dielectric-constant films

    The mechanical properties of ultra-low-dielectric-constant films by Wang, Y.H., Moitreyee, M.R., Kumar, R., Wu, S.Y., Xie, J.L., Yew, P., Subramanian, B., Shen, L., Zeng, K.Y.

    Published in Thin solid films
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