Search Results - Mukherjee-Roy, M.

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  1. 1
    Localized germanium-on-insulator patterns on Si by novel etching scheme in CF4/O2 plasma

    Localized germanium-on-insulator patterns on Si by novel etching scheme in CF4/O2 plasma by RAMANA MURTHY, B, BALASUBRAMANIAN, N, BALAKUMAR, S, MUKHERJEE-ROY, M, TRIGG, A, KUMAR, R, KWONG, D. L

    Published in Thin solid films
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  2. 2
    A dual-strained CMOS structure through simultaneous formation of relaxed and compressive strained-SiGe-on-insulator

    A dual-strained CMOS structure through simultaneous formation of relaxed and compressive strained-SiGe-on-insulator by Bera, L.K., Mukherjee-Roy, M., Abidha, B., Agarwal, A., Loh, W.Y., Tung, C.H., Kumar, R., Trigg, A.D., Foo, Y.L., Tripathy, S., Lo, G.Q., Balasubramanian, N., Kwong, D.L.

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  3. 3
    Reactive ion etching and characterization of p-silk ultra low-k film

    Reactive ion etching and characterization of p-silk ultra low-k film by Murthy, B.R., Mukherjee-Roy, M., Krishnamoorthy, A., Frye, D.C.

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  4. 4
    A Dual BARC method for Lithography and Etch for Dual Damascene with Low K

    A Dual BARC method for Lithography and Etch for Dual Damascene with Low K by Roy, Moitreyee, Bliznetsov, Vladimir, Samudra, Ganesh

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  5. 5
    Eliminating Sidewall Damage During Etch Process for Ultra Low- k Film

    Eliminating Sidewall Damage During Etch Process for Ultra Low- k Film by Badam, Ramana Murthy, Mukherjee-Roy, Moitreyee, Shaoyu, Wu, Naman, Ananth

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  6. 6
    A new approach for eliminating unwanted patterns in attenuated phase shift masks

    A new approach for eliminating unwanted patterns in attenuated phase shift masks by Mukherjee-Roy, M., Singh, N., Mehta, S.S., Samudra, G.S.

    Published in Microelectronics
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  7. 7
    Localized germanium-on-insulator patterns on Si by novel etching scheme in CF 4/O 2 plasma

    Localized germanium-on-insulator patterns on Si by novel etching scheme in CF 4/O 2 plasma by Ramana Murthy, B., Balasubramanian, N., Balakumar, S., Mukherjee-Roy, M., Trigg, A., Kumar, R., Kwong, D.L.

    Published in Thin solid films
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  8. 8
    A Two-Step Oxidation Mediated Condensation Process for Ultrathin High Ge Content SiGe Epitaxial Films on Insulator

    A Two-Step Oxidation Mediated Condensation Process for Ultrathin High Ge Content SiGe Epitaxial Films on Insulator by Mukherjee-Roy, M., Agarwal, A., Balakumar, S., Du, A. Y., Trigg, A. D., Kumar, R., Balasubramanian, N., Kwong, D. L.

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  9. 9
    Defocusing image to pattern contact holes using attenuated phase shift masks

    Defocusing image to pattern contact holes using attenuated phase shift masks by Singh, Navab, Mukherjee-Roy, Moitreyee, Mehta, Sohan Singh

    Published in Microelectronics
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  10. 10
    Resist pattern peeling assessment in DUV chemically amplified resist

    Resist pattern peeling assessment in DUV chemically amplified resist by Mehta, Sohan Singh, Qin, Sun Hai, Mukherjee-Roy, Moitreyee, Singh, Navab, Kumar, Rakesh

    Published in Microelectronics
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  11. 11
    Placement of scattering bars in binary and attenuated phase shift mask for damascene trench patterning

    Placement of scattering bars in binary and attenuated phase shift mask for damascene trench patterning by Singh Mehta, Sohan, Singh, Navab, Mukherjee-Roy, Moitreyee, Kumar, Rakesh

    Published in Microelectronics
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  12. 12
    Pollution Reduction by Rationalization in Indian Firms

    Pollution Reduction by Rationalization in Indian Firms by Martínez-Zarzoso, Inma, Roy-Mukherjee, Shampa, Semrau, Finn-Ole, Voicu, Anca M

    Published in Policy File
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